Journal of Materials Chemistry C _ Back Cover

28 June 2023, Issue 24,

Page 7843 to 8324

Atomic layer deposition of HfNx films and improving the film performance by annealing under NH₃ atmosphere

Seung Kyu Ryoo, Beom Yong Kim, Yong Bin Lee, Hyeon Woo Park, Suk Hyun Lee, Minsik Oh, 

In Soo Lee, Seung Yong Byun, Doo Sup Shim, Jae Hoon Lee, Ha Ni Kim, Kyung Do Kim and Cheol Seong Hwang

https://pubs.rsc.org/en/content/articlelanding/2023/tc/d3tc90127k

Image created by Younghee Lee / CUBE3D Graphic.